A FIELD-EMISSION E-BEAM SYSTEM FOR NANOMETER LITHOGRAPHY

被引：10

作者：

STEPHANI, D

KRATSCHMER, E

BENEKING, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582664

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1011 / 1013

页数：3

共 7 条

[1] SUB-20-NM-WIDE METAL LINES BY ELECTRON-BEAM EXPOSURE OF THIN POLY(METHYL METHACRYLATE) FILMS AND LIFTOFF
BEAUMONT, SP
BOWER, PG
TAMAMURA, T
WILKINSON, CDW
[J]. APPLIED PHYSICS LETTERS, 1981, 38 (06) : 436 - 439
[2] COANE PJ, 1982, OCT P MICR ENG GREN, P373
[3] 400-A LINEWIDTH E-BEAM LITHOGRAPHY ON THICK SILICON SUBSTRATES
HOWARD, RE
HU, EL
JACKEL, LD
GRABBE, P
TENNANT, DM
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (07) : 592 - 594
[4] INSITU VAPORIZATION OF VERY LOW-MOLECULAR WEIGHT RESISTS USING 1-2 NM DIAMETER ELECTRON-BEAMS
ISAACSON, M
MURRAY, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1117 - 1120
[5] AN E-BEAM MICROFABRICATION SYSTEM FOR NANOLITHOGRAPHY
LEE, KL
AHMED, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 946 - 949
[6] MATERIALS AND TECHNIQUES USED IN NANOSTRUCTURE FABRICATION
MOLZEN, WW
BROERS, AN
CUOMO, JJ
HARPER, JME
LAIBOWITZ, RB
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 269 - 272
[7] PREPARATION OF X-RAY LITHOGRAPHY MASKS WITH LARGE AREA SANDWICH STRUCTURE MEMBRANE
SUZUKI, K
MATSUI, J
KADOTA, T
ONO, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (08) : 1447 - 1448