X-RAY-EMISSION STUDIES OF CHEMICAL BONDING IN TRANSITION-METAL SILICIDES

被引：51

作者：

WEIJS, PJW

VANLEUKEN, H

DEGROOT, RA

FUGGLE, JC

REITER, S

WIECH, G

BUSCHOW, KHJ

机构：

[1] CATHOLIC UNIV NIJMEGEN,FAC SCI,MAT RES INST,6525 ED NIJMEGEN,NETHERLANDS

[2] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS

来源：

PHYSICAL REVIEW B | 1991年 / 44卷 / 15期

关键词：

D O I：

10.1103/PhysRevB.44.8195

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present Si L2,3 emission-band spectra of a series of 3d and 4d transition-metal (TM) silicides, together with Si K emission-band spectra of four 3d TM disilicides. The data are compared with augmented-spherical-wave density-of-states (DOS) calculations, and good agreement is found. The trends we find are explained with a general scheme for chemical bonding in TM silicides. The differences between the experimental data and the calculated DOS curves are tentatively attributed to self-energy effects.

引用

页码：8195 / 8203

页数：9

共 52 条

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ANISIMOV VI, 1986, PHYS MET METALLOGR, V62, P96

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