ION ENERGY ANALYSIS FOR SPUTTERING-TYPE ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA

被引：24

作者：

MATSUOKA, M

ONO, K

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 10期

关键词：

D O I：

10.1063/1.342534

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：5179 / 5182

页数：4

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