MECHANICAL SYSTEM FOR MULTIPLE THIN FILM DEPOSITION

被引：3

作者：

RANDLETT, MR

STROBERG, EH

CHOPRA, KL

机构：

来源：

关键词：

D O I：

10.1063/1.1719986

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：1378 / &

共 9 条

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[2] SIMPLIFIED TECHNIQUE FOR USE IN MULTIPLE THIN-FILM DEPOSITION SYSTEMS
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PHAIR, HW
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KRASZEWSKI, WV
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1964, 35 (12) : 1718 - +
[3] MODULAR ELECTRON BEAM SOURCE FOR THIN FILM DEPOSITION
CHOPRA, KL
RANDLETT, MR
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1966, 37 (10) : 1421 - &
[4] DUTHIE A, 1963, ELECTRON ENGNG, V35, P430
[5] SIMPLE ARRANGEMENT FOR EVAPORATING MULTILAYER FILMS THROUGH DIFFERENT MASKS IN ULTRAHIGH VACUUM
HOEKSTRA, JP
WHITE, P
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1961, 32 (03) : 362 - &
[6] A MASKING JIG FOR MULTIPLE FILM DEPOSITION
NUNN, FA
CAMPBELL, DS
[J]. JOURNAL OF SCIENTIFIC INSTRUMENTS, 1963, 40 (06): : 337 - &
[7] VACUUM - AUTOMATED EXPERIMENTAL VACUUM DEPOSITION SYSTEM
TANDESKI, DA
HANSON, MM
OBERG, PE
[J]. VACUUM, 1964, 14 (01) : 3 - &
[8] TAYLOR K, 1961, 8 P NAT VAC S, P981
[9] ZERBST H, 1963, VACUUM TECHNOL, V12, P173