OBSERVATION OF AN ELECTRONIC PLASMA IN PICOSECOND LASER ANNEALING OF SILICON

被引：62

作者：

VONDERLINDE, D

FABRICIUS, N

机构：

来源：

APPLIED PHYSICS LETTERS | 1982年 / 41卷 / 10期

关键词：

D O I：

10.1063/1.93367

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：991 / 993

页数：3

共 9 条

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[3]

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APPLIED PHYSICS LETTERS, 1982, 40 (07) :624-626

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APPLIED PHYSICS LETTERS, 1981, 39 (09) :755-757

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LIU, JM ;

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APPLIED PHYSICS LETTERS, 1982, 41 (07) :643-646

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[9] DYNAMICS OF DENSE LASER-INDUCED PLASMAS [J].

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