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POSITIVE AND NEGATIVE CHARGE GENERATION BY HOT CARRIERS IN N-MOSFETS
被引:20
作者
:
BORCHERT, B
论文数:
0
引用数:
0
h-index:
0
BORCHERT, B
HOFMANN, KR
论文数:
0
引用数:
0
h-index:
0
HOFMANN, KR
DORDA, G
论文数:
0
引用数:
0
h-index:
0
DORDA, G
机构
:
来源
:
ELECTRONICS LETTERS
|
1983年
/ 19卷
/ 18期
关键词
:
D O I
:
10.1049/el:19830508
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:746 / 747
页数:2
相关论文
共 5 条
[1]
HOFMANN KR, 1983, P INT C INSULATING F
[2]
EFFECTS OF AVALANCHE INJECTION OF ELECTRONS INTO SILICON DIOXIDE - GENERATION OF FAST AND SLOW INTERFACE STATES
LAI, SK
论文数:
0
引用数:
0
h-index:
0
LAI, SK
YOUNG, DR
论文数:
0
引用数:
0
h-index:
0
YOUNG, DR
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(10)
: 6231
-
6240
[3]
INSTABILITY OF MOSFET DUE TO REDISTRIBUTION OF OXIDE CHARGES
NG, KK
论文数:
0
引用数:
0
h-index:
0
NG, KK
TAYLOR, GW
论文数:
0
引用数:
0
h-index:
0
TAYLOR, GW
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1982,
29
(08)
: 1323
-
1330
[4]
EFFECT OF ELECTRON TRAPPING ON IGFET CHARACTERISTICS
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
NING, TH
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
OSBURN, CM
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
YU, HN
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1977,
6
(02)
: 65
-
76
[5]
INTERFACE STATES IN MOSFETS DUE TO HOT-ELECTRON INJECTION DETERMINED BY THE CHARGE PUMPING TECHNIQUE
SCHMITT, D
论文数:
0
引用数:
0
h-index:
0
SCHMITT, D
DORDA, G
论文数:
0
引用数:
0
h-index:
0
DORDA, G
[J].
ELECTRONICS LETTERS,
1981,
17
(20)
: 761
-
762
←
1
→
共 5 条
[1]
HOFMANN KR, 1983, P INT C INSULATING F
[2]
EFFECTS OF AVALANCHE INJECTION OF ELECTRONS INTO SILICON DIOXIDE - GENERATION OF FAST AND SLOW INTERFACE STATES
LAI, SK
论文数:
0
引用数:
0
h-index:
0
LAI, SK
YOUNG, DR
论文数:
0
引用数:
0
h-index:
0
YOUNG, DR
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(10)
: 6231
-
6240
[3]
INSTABILITY OF MOSFET DUE TO REDISTRIBUTION OF OXIDE CHARGES
NG, KK
论文数:
0
引用数:
0
h-index:
0
NG, KK
TAYLOR, GW
论文数:
0
引用数:
0
h-index:
0
TAYLOR, GW
SINHA, AK
论文数:
0
引用数:
0
h-index:
0
SINHA, AK
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1982,
29
(08)
: 1323
-
1330
[4]
EFFECT OF ELECTRON TRAPPING ON IGFET CHARACTERISTICS
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
NING, TH
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
OSBURN, CM
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
YU, HN
[J].
JOURNAL OF ELECTRONIC MATERIALS,
1977,
6
(02)
: 65
-
76
[5]
INTERFACE STATES IN MOSFETS DUE TO HOT-ELECTRON INJECTION DETERMINED BY THE CHARGE PUMPING TECHNIQUE
SCHMITT, D
论文数:
0
引用数:
0
h-index:
0
SCHMITT, D
DORDA, G
论文数:
0
引用数:
0
h-index:
0
DORDA, G
[J].
ELECTRONICS LETTERS,
1981,
17
(20)
: 761
-
762
←
1
→