ASSESSMENT OF PROFILE BROADENING DURING SPUTTERING

被引：16

作者：

REMMERIE, J

VANDERVORST, W

MAES, HE

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1986年 / 13卷 / 1-3期

关键词：

D O I：

10.1016/0168-583X(86)90539-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：416 / 420

页数：5

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[11] PROFILE DISTORTIONS AND ATOMIC MIXING IN SIMS ANALYSIS USING OXYGEN PRIMARY IONS
WITTMAACK, K
WACH, W
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 191 (1-3): : 327 - 334
[12] ASSESSMENT OF THE RELATIVE CONTRIBUTION OF ATOMIC MIXING AND SELECTIVE SPUTTERING TO BEAM INDUCED BROADENING IN SIMS DEPTH PROFILING
WITTMAACK, K
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 750 - 754