ASSESSMENT OF THE RELATIVE CONTRIBUTION OF ATOMIC MIXING AND SELECTIVE SPUTTERING TO BEAM INDUCED BROADENING IN SIMS DEPTH PROFILING

被引:24
作者
WITTMAACK, K
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D O I
10.1016/0168-583X(85)90463-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
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页码:750 / 754
页数:5
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