ADSORPTION OF WATER-VAPOR ON SI(111) SURFACES

被引：10

作者：

FUJIWARA, K ^{[1
]}

NISHIJIMA, M ^{[1
]}

机构：

[1] MITSUBISHI ELECT CORP,CENT RES LAB,AMAGASAKI,HYOGO,JAPAN

来源：

PHYSICS LETTERS A | 1975年 / 55卷 / 04期

关键词：

D O I：

10.1016/0375-9601(75)90716-1

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：211 / 212

页数：2

相关论文

共 9 条

[1] BOONSTRA AH, 1968, PHILIPS RES REPT S3
[2] FUJIWARA K, IN PRESS
[3] ADSORPTION OF WATER-VAPOR ON CLEAN CLEAVED GERMANIUM .1. STRUCTURAL AND KINETIC-PROPERTIES
HENZLER, M
TOPLER, J
[J]. SURFACE SCIENCE, 1973, 40 (02) : 388 - 396
[4] HYDROGEN ADSORPTION AND SURFACE-STRUCTURES OF SILICON
IBACH, H
ROWE, JE
[J]. SURFACE SCIENCE, 1974, 43 (02) : 481 - 492
[5] ELECTRONIC-TRANSITIONS OF OXYGEN ADSORBED ON CLEAN SILICON (111) AND (100) SURFACES
IBACH, H
ROWE, JE
[J]. PHYSICAL REVIEW B, 1974, 9 (04): : 1951 - 1957
[6] ADSORPTION OF OXYGEN ON A CLEAN SILICON SURFACE
MEYER, F
VRAKKING, JJ
[J]. SURFACE SCIENCE, 1973, 38 (01) : 275 - 281
[7] ELLIPSOMETRIC STUDY OF ADSORPTION COMPLEXES ON SILICON
MEYER, F
[J]. SURFACE SCIENCE, 1971, 27 (01) : 107 - &
[8] NISHIJIMA M, 1974, JPN J APPL PHYS, P303
[9] SURFACE-STATE TRANSITIONS OF SILICON IN ELECTRON ENERGY-LOSS SPECTRA
ROWE, JE
IBACH, H
[J]. PHYSICAL REVIEW LETTERS, 1973, 31 (02) : 102 - 105