PHOTOLUMINESCENCE STUDY OF VERTICAL TRANSPORT IN SI1-XGEX/SI HETEROSTRUCTURES

被引:8
作者
LENCHYSHYN, LC [1 ]
THEWALT, MLW [1 ]
STURM, JC [1 ]
XIAO, X [1 ]
机构
[1] PRINCETON UNIV,DEPT ELECT ENGN,PRINCETON,NJ 08544
来源
PHYSICAL REVIEW B | 1993年 / 47卷 / 24期
关键词
D O I
10.1103/PhysRevB.47.16659
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have observed band-edge photoluminescence from excitons in the center Si0.75Ge0.25 well of a triple-quantum-well structure, due to tunneling through the Si barriers from the two outer Si0.87Ge0.13 wells. Most of the photogenerated carriers originated in the Si substrate and cap, and migrated to the nearest Si1-xGex wells (i.e., the outer wells), where in the absence of tunneling they became trapped. For Si barrier widths of 9 nm or less, center-well luminescence was observed, indicating the occurrence of tunneling. Time-decay measurements of the outer-well luminescence gave an estimated tunneling time of congruent-to 325 +/- 100 ns for 9-nm barriers, at which point luminescence was seen from both the center and outer wells. We also observed thermal hopping of carriers from the outer wells over the Si barriers and into the center well at high temperatures.
引用
收藏
页码:16659 / 16662
页数:4
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