FABRICATION OF FINE PATTERNS BY POSITIVE WORKING RESISTS USING A POLYIMIDE LANGMUIR-BLODGETT-FILM SYSTEM

被引：6

作者：

IWAMOTO, M

KASAHARA, S

YONEDA, Y

IRIYAMA, K

NISHIKATA, Y

KAKIMOTO, MA

IMAI, Y

机构：

[1] FUJITSU LABS LTD,ORGAN MAT LABS,ATSUGI 24301,JAPAN

[2] JIKEI UNIV,INST MED SCI,DIV,TOKYO 105,JAPAN

[3] TOKYO INST TECHNOL,DEPT ORGAN & POLYMER MAT,MEGURO KU,TOKYO 152,JAPAN

来源：

THIN SOLID FILMS | 1992年 / 210卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(92)90312-Y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Using a solution of polyamic acid salt obtained in combination with polyamic acid and N-icocylpyrrolidine, we successfully prepared thermally stable multilayer films of disilane-containing polyimide by Langmuir-Blodgett technique. The films were found to act as positive-working deep UV resists.

引用

页码：461 / 464

页数：4

共 7 条

[1]

BARRAUD A, 1979, SOLID STATE TECH AUG, P120

[2] FINE PATTERNS OF POSITIVE-WORKING RESISTS USING A POLYIMIDE LANGMUIR-BLODGETT-FILM SYSTEM [J].