THERMODYNAMIC ANALYSIS AND KINETIC IMPLICATIONS OF CHEMICAL VAPOR-DEPOSITION OF SIC FROM SI-C-CL-H GAS SYSTEMS

被引：78

作者：

FISCHMAN, GS ^{[1
]}

PETUSKEY, WT ^{[1
]}

机构：

[1] UNIV ILLINOIS, MAT RES LAB, URBANA, IL 61801 USA

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1985年 / 68卷 / 04期

关键词：

D O I：

10.1111/j.1151-2916.1985.tb15295.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

18

引用

收藏

页码：185 / 190

页数：6

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