FEMTOSECOND ELLIPSOMETRIC STUDY OF NONEQUILIBRIUM CARRIER DYNAMICS IN GE AND EPITAXIAL SI1-XGEX

被引:27
作者
CHOO, HR [1 ]
HU, XF [1 ]
DOWNER, MC [1 ]
KESAN, VP [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.109671
中图分类号
O59 [应用物理学];
学科分类号
摘要
The time-resolved, above-gap optical response of optically thick Si1-xGex alloys to carrier injection by a femtosecond pump pulse is measured across the entire compositional range (0 less-than-or-equal-to x less-than-or-equal-to 1) using a novel femtosecond ellipsometric technique which clearly distinguishes the real and imaginary parts of the time-varying dielectric function epsilon1(t)+iepsilon2(t). The results are modeled microscopically in terms of the Drude contribution from a diffusing hot electron-hole plasma, augmented by transient-induced absorption from hot-carrier-induced band renormalization. Further corrections from thermal band-gap shrinkage, intervalley scattering, and transient interband absorption saturation are also discussed.
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页码:1507 / 1509
页数:3
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