NOVEL PROPERTIES OF A 0.1-MU-M-LONG SPLIT-GATE MODFET

A MODFET with two 30-nm-long gates, separated by 40 nm, has been fabricated using ultrahigh-resolution electron-beam lithography. The proximity of the two gate fingers, together with the ability to independently bias them, results in the following features: a) tunability of the threshold voltage, b) enhancement of the transconductance especially at low current levels, c) reduction in short-channel effects, and d) high-voltage gain and cutoff frequency. © 1990 IEEE