ION-BASED GROWTH OF SPECIAL FILMS - TECHNIQUES AND MECHANISMS

被引:93
作者
WEISSMANTEL, C
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D O I
10.1016/0040-6090(82)90187-0
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:55 / 63
页数:9
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共 19 条
[1]   STRUCTURE AND PROPERTIES OF TRANSPARENT AND HARD CARBON-FILMS [J].
BEWILOGUA, K ;
DIETRICH, D ;
PAGEL, L ;
SCHURER, C ;
WEISSMANTEL, C .
SURFACE SCIENCE, 1979, 86 (JUL) :308-313
[2]   ON THE NATURE OF RADIATION DAMAGE IN METALS [J].
BRINKMAN, JA .
JOURNAL OF APPLIED PHYSICS, 1954, 25 (08) :961-970
[3]   NITRIDE FILM DEPOSITION BY REACTIVE ION-BEAM SPUTTERING [J].
ERLER, HJ ;
REISSE, G ;
WEISSMANTEL, C .
THIN SOLID FILMS, 1980, 65 (02) :233-245
[4]   SOME TRENDS IN PREPARING FILM STRUCTURES BY ION-BEAM METHODS [J].
GAUTHERIN, G ;
WEISSMANTEL, C .
THIN SOLID FILMS, 1978, 50 (MAY) :135-144
[5]   CRYSTALLOGRAPHIC ORIENTATION OF SILICON ON AN AMORPHOUS SUBSTRATE USING AN ARTIFICIAL SURFACE-RELIEF GRATING AND LASER CRYSTALLIZATION [J].
GEIS, MW ;
FLANDERS, DC ;
SMITH, HI .
APPLIED PHYSICS LETTERS, 1979, 35 (01) :71-74
[6]   SILICON GRAPHOEPITAXY USING A STRIP-HEATER OVEN [J].
GEIS, MW ;
ANTONIADIS, DA ;
SILVERSMITH, DJ ;
MOUNTAIN, RW ;
SMITH, HI .
APPLIED PHYSICS LETTERS, 1980, 37 (05) :454-456
[7]  
Harper J. M. E., 1978, THIN FILM PROCESSES, P175
[8]   LOW-ENERGY ION IMPACT PHENOMENA ON SINGLE-CRYSTAL SURFACES [J].
HARRISON, DE ;
KELLY, PW ;
GARRISON, BJ ;
WINOGRAD, N .
SURFACE SCIENCE, 1978, 76 (02) :311-322
[9]  
Reisse G., 1980, Wissenschaftliche Zeitschrift der Technischen Hochschule Karl-Marx-Stadt, V22, P653
[10]   USE OF RING GAP PLASMATRON FOR HIGH-RATE SPUTTERING [J].
SCHILLER, S ;
HEISIG, U ;
GOEDICKE, K .
THIN SOLID FILMS, 1977, 40 (JAN) :327-334