ELLIPSOMETRIC THICKNESS MEASUREMENTS OF PMMA ON GAAS

被引：6

作者：

SCHEPS, R ^{[1
]}

机构：

[1] COLORADO STATE UNIV,DEPT ELECT ENGN,FT COLLINS,CO 80523

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 10期

关键词：

D O I：

10.1149/1.2123491

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2273 / 2276

页数：4

共 10 条

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[2]

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[3]

LEVY L, 1980, APPLIED OPTICS, V2

[4] MEASUREMEMT OF THICKNESS AND REFRACTIVE INDEX OF VERY THIN FILMS AND OPTICAL PROPERTIES OF SURFACES BY ELLIPSOMETRY [J].

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PASSAGLIA, E ;

STROMBERG, RR ;

STEINBERG, HL .

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[5]

MCLAUGHLIN RB, 1977, SPECIAL METHODS LIGH

[6]

PLISKIN WA, 1969, PHYSICAL MEASUREMENT

[7]

SERAPHIN BO, 1967, SEMICONDUCTORS SEMIM, V3

[8] ELLIPSOMETRIC TECHNIQUE FOR OBTAINING SUBSTRATE OPTICAL CONSTANTS [J].

SHEWCHUN, J ;

ROWE, EC .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (10) :4128-&

[9] PROCESS MONITOR OF RESIDUAL FILMS BY ELLIPSOMETRY [J].

TWU, BL .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (09) :1589-1591

[10]

ZEISSE CR, 1977, NOSC323 NAV OC SYST

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