PLASMA-DEPOSITED THIN-FILM STEP COVERAGE CALCULATED BY COMPUTER-SIMULATION

被引：26

作者：

ROSS, RC ^{[1
]}

VOSSEN, JL ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

APPLIED PHYSICS LETTERS | 1984年 / 45卷 / 03期

关键词：

D O I：

10.1063/1.95196

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：239 / 240

页数：2

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