A 3-LAYER RESIST SYSTEM FOR DEEP UV AND RIE MICROLITHOGRAPHY ON NONPLANAR SURFACES

被引：35

作者：

BASSOUS, E ^{[1
]}

EPHRATH, LM ^{[1
]}

PEPPER, G ^{[1
]}

MIKALSEN, DJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 02期

关键词：

D O I：

10.1149/1.2119735

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：478 / 484

页数：7

共 61 条

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