THE IMAGE-FORCE EFFECT AT A METAL-SEMICONDUCTOR CONTACT WITH AN INTERFACIAL INSULATOR LAYER

被引：20

作者：

TUGULEA, A ^{[1
]}

DASCALU, D ^{[1
]}

机构：

[1] POLYTECH INST BUCHAREST,DEPT ELECTR & COMMUN,R-77748 BUCHAREST,ROMANIA

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 10期

关键词：

D O I：

10.1063/1.333816

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：2823 / 2891

页数：69

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