COMPARISON OF THE PROPERTIES OF HYDROGENATED MICROCRYSTALLINE SILICON FILMS DEPOSITED BY PHOTO CHEMICAL-VAPOR DEPOSITION AND GLOW-DISCHARGE DEPOSITION PROCESSES

被引：9

作者：

DUTTA, J

UNAOGU, AL

RAY, S

BARUA, AK

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 10期

关键词：

D O I：

10.1063/1.343829

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：4709 / 4714

页数：6

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