HIGH-PRESSURE DETERMINATION OF ALGAINP BAND-STRUCTURE

被引:26
作者
PRINS, AD [1 ]
SLY, JL [1 ]
MENEY, AT [1 ]
DUNSTAN, DJ [1 ]
OREILLY, EP [1 ]
ADAMS, AR [1 ]
VALSTER, A [1 ]
机构
[1] PHILIPS OPTOELECTR CTR,5600 JA EINDHOVEN,NETHERLANDS
基金
英国工程与自然科学研究理事会;
关键词
SEMICONDUCTORS; HIGH PRESSURE; ELECTRONIC STRUCTURE; LUMINESCENCE;
D O I
10.1016/0022-3697(94)00206-1
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Low temperature photoluminescence measurements have been carried out at hydrostatic pressures up to 80 kbar to determine the band structure of the disordered (AlxGa1-x)(0.5)In0.5P alloy system. Using a series of specifically designed samples we have measured how the Gamma, L and X conduction band energies vary with strain and aluminium content. The direct band gap varies linearly from that of GaInP at a rate of 0.61x eV. The position of the X minimum in GaInP is found to be 280 meV above the Gamma, increasing linearly with aluminium content at a rate of 0.085x eV. Measurements of unstrained and 1% compressively strained GaInP put tower limits on the Gamma(c)-L(c) separation of 125 meV and 175 meV, respectively.
引用
收藏
页码:349 / 352
页数:4
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