HIGH-RATE DEPOSITION OF IRON-OXIDE THIN-FILMS BY REACTIVE SPUTTERING

被引：7

作者：

OUCHI, H

UMESAKI, M

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1983年 / 19卷 / 05期

关键词：

D O I：

10.1109/TMAG.1983.1062618

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1980 / 1982

页数：3

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[1] MAGNETIC RECORDING CHARACTERISTICS OF SPUTTERED GAMMA-FE2O3 THIN-FILM DISKS
HATTORI, S
ISHII, Y
SHINOHARA, M
NAKAGAWA, T
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (06) : 1549 - 1551
[2] DEPOSITION OF MAGNETITE FILMS BY REACTIVE SPUTTERING OF IRON
HELLER, J
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1976, 12 (04) : 396 - 400
[3] FERRITE THIN-FILMS FOR HIGH RECORDING DENSITY
INAGAKI, N
HATTORI, S
ISHII, Y
TERADA, A
KATSURAKI, H
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1976, 12 (06) : 785 - 787
[4] NEW PREPARATION PROCESS FOR SPUTTERED GAMMA-FE2O3 THIN-FILM DISKS
ISHII, Y
TERADA, A
ISHII, O
OHTA, S
HATTORI, S
MAKINO, K
[J]. IEEE TRANSACTIONS ON MAGNETICS, 1980, 16 (05) : 1114 - 1116