SURFACE ELECTRONIC AND ATOMIC-STRUCTURE OF ERSI1.7 ON SI(111)

被引:17
作者
STAUFFER, L
MHARCHI, A
SAINTENOY, S
PIRRI, C
WETZEL, P
BOLMONT, D
GEWINNER, G
机构
[1] Laboratoire de Physique et de Spectroscopie Electronique, Faculté des Sciences et Techniques, 68093 Mulhouse Cedex
关键词
D O I
10.1103/PhysRevB.52.11932
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The surface atomic and electronic structure of ErSi1.7 layers epitaxially grown on Si(111) is studied by angle-resolved ultraviolet photoemission spectroscopy. The experimental results are compared to electronic band-structure calculations for various reasonable surface atomic configurations. Satisfactory agreement is obtained for two geometries consisting of reconstructed ErSi1.7 (0001) surfaces. Both reconstructions involve a buckled Si top layer similar to (111) double layers in bulk Si but differ in their registries with respect to the bulk silicide layer underneath, leading to a silicide surface termination with ErSi1.7 stoichiometry. In contrast, the calculations clearly show that a surface termination with ErSi1.7 stoichiometry involving an ordered array of vacancies in the buckled Si top layer would result in a quite different surface electronic structure incompatible with the experimental one. This allows us to rule out this model often invoked in previous work. Finally, models exposing a bulklike flat Si graphitelike top layer, with or without vacancies, can also safely be ruled out on the basis of the present data.
引用
收藏
页码:11932 / 11937
页数:6
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