0.1-MU-M GATE LENGTH MODFETS WITH UNITY CURRENT GAIN CUTOFF FREQUENCY ABOVE 110 GHZ

被引:27
作者
LEPORE, AN
LEVY, HM
TIBERIO, RC
TASKER, PJ
LEE, H
WOLF, ED
EASTMAN, LF
KOHN, E
机构
[1] CORNELL UNIV,SCH ELECT ENGN,NATL NANOFABRICAT FACIL,KNIGHT LAB,ITHACA,NY 14853
[2] SIEMENS RES & TECHNOL LABS,PRINCETON,NJ 08540
关键词
D O I
10.1049/el:19880247
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
7
引用
收藏
页码:364 / 366
页数:3
相关论文
共 7 条
[1]  
Camnitz L. H., 1984, International Electron Devices Meeting. Technical Digest (Cat. No. 84CH2099-0), P360
[2]   0.1-MU-M GATE-LENGTH PSEUDOMORPHIC HEMTS [J].
CHAO, PC ;
TIBERIO, RC ;
DUH, KHG ;
SMITH, PM ;
BALLINGALL, JM ;
LESTER, LF ;
LEE, BR ;
JABRA, A ;
GIFFORD, GG .
IEEE ELECTRON DEVICE LETTERS, 1987, 8 (10) :489-491
[3]   ELECTRON-BEAM FABRICATION OF GAAS LOW-NOISE MESFETS USING A NEW TRILAYER RESIST TECHNIQUE [J].
CHAO, PC ;
SMITH, PM ;
PALMATEER, SC ;
HWANG, JCM .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (06) :1042-1046
[4]   ENHANCEMENT OF ELECTRON VELOCITY IN MODULATION-DOPED (AL, GA)AS GAAS-FETS AT CRYOGENIC TEMPERATURES [J].
DRUMMOND, TJ ;
SU, SL ;
LYONS, WG ;
FISCHER, R ;
KOPP, W ;
MORKOC, H ;
LEE, K ;
SHUR, MS .
ELECTRONICS LETTERS, 1982, 18 (24) :1057-1058
[5]   PMMA CO-POLYMERS AS HIGH-SENSITIVITY ELECTRON RESISTS [J].
HATZAKIS, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1984-1988
[6]  
KOHN E, 1987, 14TH INT S GAAS REL
[7]   MICROWAVE PERFORMANCE OF 0.25-MU-M GATE LENGTH HIGH ELECTRON-MOBILITY TRANSISTORS [J].
MISHRA, UK ;
PALMATEER, SC ;
CHAO, PC ;
SMITH, PM ;
HWANG, JCM .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (03) :142-145