A REVIEW OF LASER-BEAM APPLICATIONS FOR PROCESSING SILICON

被引：2

作者：

BOYD, IW

机构：

来源：

CONTEMPORARY PHYSICS | 1983年 / 24卷 / 05期

关键词：

D O I：

10.1080/00107518308210697

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：461 / 490

页数：30

共 62 条

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[5]

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[8] OXIDATION OF SILICON SURFACES BY CO2-LASERS [J].

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[9]

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[10]

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