MASKLESS SUBMICROMETER PATTERN-FORMATION OF CR FILMS BY FOCUSED SB ION-IMPLANTATION

被引：9

作者：

GAMO, K

MORIIZUMI, K

OCHIAI, Y

TAKAI, M

NAMBA, S

SHIOKAWA, T

MINAMISONO, T

机构：

[1] INST PHYS & CHEM RES,WAKO,SAITAMA 351,JAPAN

[2] OSAKA UNIV,FAC SCI,TOYONAKA,OSAKA 560,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 08期

关键词：

D O I：

10.1143/JJAP.23.L642

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L642 / L645

页数：4

共 15 条

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[8]

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[9] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J].

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[10] FABRICATION OF A GRATING PATTERN WITH SUBMICROMETER DIMENSION IN SILICON CRYSTAL BY ION-BOMBARDMENT-ENHANCED ETCHING [J].

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NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (03) :491-494

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