THERMAL DONORS IN SILICON - AN INVESTIGATION OF THEIR STRUCTURE WITH ELECTRON-NUCLEAR DOUBLE-RESONANCE

被引:8
作者
MEILWES, N [1 ]
SPAETH, JM [1 ]
GOTZ, W [1 ]
PENSL, G [1 ]
机构
[1] UNIV ERLANGEN NURNBERG,INST ANGEW PHYS,D-91058 ERLANGEN,GERMANY
关键词
D O I
10.1088/0268-1242/9/9/009
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Singly ionized thermal double donors (TDD+), which have the so-called NL8 EPR spectrum, have been investigated with electron nuclear double resonance (ENDOR) in silicon doped with various acceptors (Al, B, In, Ga). No differences were detected in the ENDOR spectra and no signals due to any of the acceptors. TDDS appear to be heat treatment centres which do not involve any impurities except oxygen. The magnetic isotope O-17 was diffused into B-doped oxygen-poor float-zone silicon and TDD+ s were formed with various durations of heat treatment at 470-degrees-C up to 200 h. The total intensity of the O-17 ENDOR lines increases overproportionally compared to the increase of the Si-29 ENDOR lines with longer heat treatment, indicating that more oxygen is added upon TDD+ growth from earlier to later species. The O-17 ENDOR lines of the latter have an almost vanishing superhyperfine interaction. Their quadrupole interactions are almost the same as those found in the earliest species detected with ENDOR. From its theoretical interpretation it is suggested that oxygen is always in an interstitial position between two Si atoms. The C2v symmetry appearing in the EPR and Si-29 ENDOR spectra does not necessarily reflect the true defect symmetry, which may be lower since the addition of O-17 does not noticeably influence the distribution of the unpaired spin density. Therefore the suggestion drawn from earlier measurements on the two early species observable with ENDOR, that four oxygen atoms may be in the defect core, should be revised. It seems that the model proposed by Deak et al is compatible with our ENDOR results.
引用
收藏
页码:1623 / 1632
页数:10
相关论文
共 30 条
[1]   ABSORPTION OF OXYGEN IN SILICON IN NEAR AND FAR INFRARED [J].
BOSOMWORTH, DR ;
HAYES, W ;
SPRAY, ARL ;
WATKINS, GD .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1970, 317 (1528) :133-+
[2]   SILICON-INTERSTITIAL OXYGEN-INTERSTITIAL COMPLEX AS A MODEL OF THE 450-DEGREES-C OXYGEN THERMAL DONOR IN SILICON [J].
DEAK, P ;
SNYDER, LC ;
CORBETT, JW .
PHYSICAL REVIEW LETTERS, 1991, 66 (06) :747-749
[3]   THEORETICAL-STUDIES ON THE CORE STRUCTURE OF THE 450-DEGREES-C OXYGEN THERMAL DONORS IN SILICON [J].
DEAK, P ;
SNYDER, LC ;
CORBETT, JW .
PHYSICAL REVIEW B, 1992, 45 (20) :11612-11626
[4]  
FULLER CS, 1954, PHYS REV, V96, P833
[5]   OBSERVATION OF 5 ADDITIONAL THERMAL DONOR SPECIES TD12 TO TD16 AND OF REGROWTH OF THERMAL DONORS AT INITIAL-STAGES OF THE NEW OXYGEN DONOR FORMATION IN CZOCHRALSKI-GROWN SILICON [J].
GOTZ, W ;
PENSL, G ;
ZULEHNER, W .
PHYSICAL REVIEW B, 1992, 46 (07) :4312-4315
[6]  
GOTZ W, 1993, MATER SCI FORUM, V117, P213
[7]  
GOTZ W, 1993, THESIS ERLANGEN NURN
[8]  
GOTZ W, 1994, UNPUBLISHED
[9]   MICROSCOPIC STRUCTURE OF THE NL10 HEAT-TREATMENT CENTER IN SILICON - STUDY BY ELECTRON-NUCLEAR DOUBLE-RESONANCE [J].
GREGORKIEWICZ, T ;
BEKMAN, HHPT ;
AMMERLAAN, CAJ .
PHYSICAL REVIEW B, 1988, 38 (06) :3998-4015
[10]  
LATHUSKO AI, 1986, PHYS STATUS SOLIDI K, V181, P93