MICROSCOPIC STRUCTURE OF THE NL10 HEAT-TREATMENT CENTER IN SILICON - STUDY BY ELECTRON-NUCLEAR DOUBLE-RESONANCE

被引：46

作者：

GREGORKIEWICZ, T ^{[1
]}

BEKMAN, HHPT ^{[1
]}

AMMERLAAN, CAJ ^{[1
]}

机构：

[1] POLISH ACAD SCI,PL-02668 WARSAW,POLAND

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 06期

关键词：

D O I：

10.1103/PhysRevB.38.3998

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3998 / 4015

页数：18

共 35 条

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