DEPOSITION OF DIAMOND-LIKE CARBON-FILM USING ELECTRON-CYCLOTRON RESONANCE PLASMA

被引：23

作者：

KUO, SC ^{[1
]}

KUNHARDT, EE ^{[1
]}

SRIVATSA, AR ^{[1
]}

机构：

[1] SUNY STONY BROOK,DEPT CHEM,MOLTECH CORP,STONY BROOK,NY 11794

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 20期

关键词：

D O I：

10.1063/1.105943

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Hard diamond-like carbon films were deposited on Si(100) substrates using a CH4 plasma created through electron cyclotron resonance (ECR) heating. The ECR plasma was excited by a Lisitano coil. These films could be deposited with a negative dc bias (-200 V) or a rf-induced negative self-bias (-100 V) on the substrates. The deposition rate of the film was about 2.3 angstrom/s. The deposited films were characterized by Raman spectroscopy and near-edge x-ray absorption fine structure analysis.

引用

页码：2532 / 2534

页数：3

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