THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .7. CONCENTRATION RANGE OF SINGLE EPSILON-PHASE PB-BI FILMS USED IN COUNTERELECTRODES

被引:5
作者
MURAKAMI, M
HUANG, HCW
ANGILELLO, J
GILBERT, BL
机构
关键词
D O I
10.1063/1.332030
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:738 / 742
页数:5
相关论文
共 14 条
[1]   THERMAL-STABILITY OF PB-ALLOY JOSEPHSON JUNCTION ELECTRODE MATERIALS .4. EFFECTS OF CRYSTAL-STRUCTURE OF PB-BI COUNTER ELECTRODES [J].
BASSON, JH ;
MURAKAMI, M ;
BOOYENS, H .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) :337-345
[2]   FABRICATION PROCESS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].
GREINER, JH ;
KIRCHER, CJ ;
KLEPNER, SP ;
LAHIRI, SK ;
WARNECKE, AJ ;
BASAVAIAH, S ;
YEN, ET ;
BAKER, JM ;
BROSIOUS, PR ;
HUANG, HCW ;
MURAKAMI, M ;
AMES, I .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :195-205
[3]  
HANSEN M, 1958, CONSTITUTION BINARY, P324
[4]   PREPARATION OF PB-BI FILM BY ALLOY EVAPORATION .1. FILM COMPOSITION CONTROL [J].
HUANG, HCW ;
GILBERT, BL .
THIN SOLID FILMS, 1982, 91 (03) :201-209
[5]   LEAD ALLOY JOSEPHSON-JUNCTIONS WITH PB-BI COUNTERELECTRODES [J].
LAHIRI, SK ;
BASAVAIAH, S ;
KIRCHER, CJ .
APPLIED PHYSICS LETTERS, 1980, 36 (04) :334-336
[6]  
Maissel L.I., 1970, HDB THIN FILM TECHNO
[7]   RESIDUAL STRAINS OF PB THIN-FILMS DEPOSITED ONTO SI SUBSTRATES [J].
MURAKAMI, M .
ACTA METALLURGICA, 1978, 26 (01) :175-183
[8]   THERMAL STRAIN IN LEAD THIN-FILMS .5. STRAIN RELAXATION ABOVE ROOM-TEMPERATURE [J].
MURAKAMI, M ;
KUAN, TS .
THIN SOLID FILMS, 1980, 66 (03) :381-394
[9]   AN EXPERIMENTAL INVESTIGATION OF EXTRAPOLATION METHODS IN THE DERIVATION OF ACCURATE UNIT-CELL DIMENSIONS OF CRYSTALS [J].
NELSON, JB ;
RILEY, DP .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1945, 57 (321) :160-177
[10]  
PREDEL B, 1967, Z METALLKD, V58, P553