RESISTANCE STABILITY OF AULN2 THIN-FILM RESISTORS FOR PB-ALLOY JOSEPHSON INTEGRATED-CIRCUITS

被引：2

作者：

HASUMI, Y

ARAI, K

WAHO, T

YANAGAWA, F

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 01期

关键词：

D O I：

10.1063/1.335348

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：96 / 101

页数：6

共 14 条

[1] THIN-FILM FABRICATION FOR THE JOSEPHSON-TECHNOLOGY CROSS-SECTIONAL MODEL [J].

BRIGHT, AA ;

GREINER, JH ;

KLEPNER, SP ;

WANG, RH ;

WARNECKE, AJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01) :77-90

[2] FABRICATION PROCESS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].

GREINER, JH ;

KIRCHER, CJ ;

KLEPNER, SP ;

LAHIRI, SK ;

WARNECKE, AJ ;

BASAVAIAH, S ;

YEN, ET ;

BAKER, JM ;

BROSIOUS, PR ;

HUANG, HCW ;

MURAKAMI, M ;

AMES, I .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :195-205

[3]

HANSEN M, 1958, CONSTITUTION BINARY, P211

[4] ELECTRICAL-RESISTIVITY OF AULN2 THIN-FILMS AT 4.2 K [J].

HASUMI, Y ;

ARAI, K ;

WAHO, T ;

YANAGAWA, F .

JOURNAL OF APPLIED PHYSICS, 1984, 55 (02) :471-475

[5]

HASUMI Y, UNPUB

[6] PROPERTIES OF AULN2 RESISTORS FOR JOSEPHSON INTEGRATED-CIRCUITS [J].

KIRCHER, CJ ;

LAHIRI, SK .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (02) :235-242

[7] LEAD-ALLOY JOSEPHSON TUNNELING GATES WITH IMPROVED STABILITY UPON THERMAL CYCLING [J].

LAHIRI, SK ;

BASAVAIAH, S .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) :2880-2884

[8] THIN-FILM RESISTOR FOR JOSEPHSON TUNNELING CIRCUITS [J].

LAHIRI, SK .

THIN SOLID FILMS, 1977, 41 (02) :209-215

[9] ELECTRICAL-RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS - CASE OF ARBITRARY REFLECTION AT EXTERNAL SURFACES [J].

MAYADAS, AF ;

SHATZKES, M .

PHYSICAL REVIEW B, 1970, 1 (04) :1382-&

[10]

MCLEAN D, 1957, GRAIN BOUNDARIES MET, P231

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