共 16 条
[1]
BATCHELDER T, 1981, SEMICONDUCTOR IN APR, P213
[2]
MASKING OF DEPOSITED THIN-FILMS BY MEANS OF AN ALUMINUM-PHOTORESIST COMPOSITE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1974, 11 (01)
:458-460
[3]
DEEP-UV PHOTORESISTS - POLY(METHYL METHACRYLATE-CO-INDENONE)
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1981, 19 (04)
:1333-1337
[4]
PMMA CO-POLYMERS AS HIGH-SENSITIVITY ELECTRON RESISTS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1979, 16 (06)
:1984-1988
[5]
HATZAKIS M, 1981, P INT C MICROLITHOGR, P386
[6]
LIN BJ, 1979, SPIE, V174, P114
[7]
LIN BJ, 1979, J VAC SCI TECHNOL, V16, P1989
[8]
MORAN JM, 1979, MAY S EL ION PHOT BE
[9]
ONG E, 1981, KODAK MICROELECTRONI, P91
[10]
REICHMANIS E, 1982, ACS SYM SER, V184, P29