X-RAY PHOTOELECTRON-SPECTROSCOPY OF SI PT AND PT SI LAYERS ON GAAS

被引：4

作者：

KURODA, T

IWAKURO, H

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 03期

关键词：

D O I：

10.1063/1.344405

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1486 / 1488

页数：3

共 12 条

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