CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE .3. STRUCTURAL FEATURES

被引：35

作者：

NIIHARA, K ^{[1
]}

HIRAI, T ^{[1
]}

机构：

[1] TOHOKU UNIV,IRON STEEL & MET RES INST,SENDAI,MIYAGI 980,JAPAN

来源：

JOURNAL OF MATERIALS SCIENCE | 1977年 / 12卷 / 06期

关键词：

D O I：

10.1007/BF02426862

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1233 / 1242

页数：10

共 41 条

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[6]

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[7]

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[8] PREPARATION AND PROPERTIES OF AMORPHOUS SILICON NITRIDE FILMS [J].

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LEE, CH ;

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[9]

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[10]

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