INVESTIGATION OF THE INITIAL-STAGES OF OXIDATION OF MICROCRYSTALLINE SILICON BY MEANS OF X-RAY PHOTOELECTRON-SPECTROSCOPY

被引：19

作者：

GIMZEWSKI, JK ^{[1
]}

VEPREK, S ^{[1
]}

机构：

[1] UNIV ZURICH,INST INORGAN CHEM,CH-8057 ZURICH,SWITZERLAND

来源：

SOLID STATE COMMUNICATIONS | 1983年 / 47卷 / 09期

关键词：

D O I：

10.1016/0038-1098(83)90648-8

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：747 / 751

页数：5

共 30 条

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[J]. PHYSICAL REVIEW A, 1979, 20 (06): : 2405 - 2410
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[J]. JOURNAL OF CHEMICAL PHYSICS, 1983, 78 (09) : 5437 - 5442
[6] INTERACTION OF OXYGEN WITH ALUMINUM (111)
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[J]. SURFACE SCIENCE, 1977, 68 (01) : 269 - 276
[7] INTRINSIC AND EXTRINSIC PLASMON COUPLING IN X-RAY PHOTOEMISSION FROM CORE STATES OF ADSORBED ATOMS
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[J]. PHYSICAL REVIEW B, 1977, 16 (04): : 1480 - 1488
[8] USE OF THIN SI CRYSTALS IN BACKSCATTERING-CHANNELING STUDIES OF SI-SIO2 INTERFACE
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[J]. PHYSICAL REVIEW LETTERS, 1978, 41 (20) : 1396 - 1399
[9] NEW PHENOMENON IN ABSORPTION OF OXYGEN ON SILICON
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[J]. PHYSICAL REVIEW LETTERS, 1978, 40 (06) : 403 - 406
[10] HIGH-RESOLUTION X-RAY PHOTOELECTRON-SPECTROSCOPY AS A PROBE OF LOCAL ATOMIC-STRUCTURE - APPLICATION TO AMORPHOUS SIO2 AND THE SI-SIO2 INTERFACE
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[J]. PHYSICAL REVIEW LETTERS, 1979, 43 (22) : 1683 - 1686

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