FERMI LEVEL PINNING AND CHEMICAL INTERACTIONS AT METAL-INXGA1-XAS(100) INTERFACES

被引：42

作者：

BRILLSON, LJ

SLADE, ML

VITURRO, RE

KELLY, MK

TACHE, N

MARGARITONDO, G

WOODALL, JM

KIRCHNER, PD

PETTIT, GD

WRIGHT, SL

机构：

[1] UNIV WISCONSIN,DEPT PHYS,MADISON,WI 53706

[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 04期

关键词：

D O I：

10.1116/1.583537

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：919 / 923

页数：5

共 40 条

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