THE GROWTH OF HIGH-QUALITY ALXGA1-XAS BY MOLECULAR-BEAM EPITAXY AND ITS APPLICATION TO DOUBLE-HETEROJUNCTION LASERS

被引:9
作者
COLLINS, DM
MARS, DE
EGLASH, SJ
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 02期
关键词
D O I
10.1116/1.582526
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:170 / 173
页数:4
相关论文
共 20 条
[1]   CURRENT THRESHOLD UNIFORMITY OF SHALLOW PROTON STRIPE GAALAS DOUBLE HETEROSTRUCTURE LASERS GROWN BY METALORGANIC-CHEMICAL VAPOR-DEPOSITION [J].
BURNHAM, RD ;
SCIFRES, DR ;
STREIFER, W .
APPLIED PHYSICS LETTERS, 1982, 40 (02) :118-119
[2]   HETEROJUNCTION-INDUCED PHENOMENA IN HALL-EFFECT AND PHOTOCONDUCTIVITY MEASUREMENTS OF EPITAXIAL ALXGA1-XAS [J].
COLLINS, DM ;
MARS, DE ;
FISCHER, B ;
KOCOT, C .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (02) :857-861
[3]   (AL,GA)AS DOUBLE-HETEROSTRUCTURE LASERS - COMPARISON OF DEVICES FABRICATED WITH DEEP AND SHALLOW PROTON-BOMBARDMENT [J].
DIXON, RW ;
JOYCE, WB .
BELL SYSTEM TECHNICAL JOURNAL, 1980, 59 (06) :975-985
[4]   MOLECULAR-BEAM EPITAXY GROWTH OF (AL,GA) AS GAAS HETEROSTRUCTURES [J].
DRUMMOND, TJ ;
MORKOC, H ;
CHO, AY .
JOURNAL OF CRYSTAL GROWTH, 1982, 56 (02) :449-454
[5]   GA(1-X)ALXAS-GA(1-Y)ALYAS DOUBLE-HETEROSTRUCTURE ROOM TEMPERATURE LASERS GROWN BY METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION [J].
DUPUIS, RD ;
DAPKUS, PD .
APPLIED PHYSICS LETTERS, 1977, 31 (12) :839-841
[6]  
ENGLEMANN RWH, 1981, I PHYS C SER, V56, P309
[7]   SUPPRESSION OF OUTPUT NONLINEARITIES IN DOUBLE-HETEROSTRUCTURE LASERS BY USE OF MISALIGNED MIRRORS [J].
FRESCURA, BL ;
HWANG, CJ ;
LUECHINGER, H ;
RIPPER, JE .
APPLIED PHYSICS LETTERS, 1977, 31 (11) :770-773
[8]   DOPING CHARACTERISTICS AND ELECTRICAL-PROPERTIES OF BE-DOPED P-TYPE ALXGA1-XAS BY LIQUID-PHASE EPITAXY [J].
FUJITA, S ;
BEDAIR, SM ;
LITTLEJOHN, MA ;
HAUSER, JR .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) :5438-5444
[9]   ELECTRICAL AND OPTICAL-PROPERTIES OF N-TYPE ALXGA1-XAS GROWN BY MO-VPE [J].
HALLAIS, J ;
ANDRE, JP ;
MIRCEAROUSSEL, A ;
MAHIEU, M ;
VARON, J ;
BOISSY, MC ;
VINK, AT .
JOURNAL OF ELECTRONIC MATERIALS, 1981, 10 (04) :665-682
[10]   A LOW-BEAM-DIVERGENCE CW (GAAL)AS DOUBLE-HETEROSTRUCTURE LASER GROWN BY LOW-PRESSURE METALLORGANIC CHEMICAL VAPOR-DEPOSITION PROCESS [J].
HIRTZ, JP ;
BUIDINHVUONG ;
DUCHEMIN, JP ;
HIRTZ, P ;
CREMOUX, BD ;
BISARO, R ;
MERENDA, P ;
BONNET, M ;
DUDA, E ;
MESQUIDA, G ;
CARBALLES, JC .
APPLIED PHYSICS LETTERS, 1980, 36 (10) :795-796