FORMATION OF SI-H BONDS ON THE SURFACE OF MICROCRYSTALLINE SILICON COVERED WITH SIOX BY HF TREATMENT

被引：181

作者：

UBARA, H

IMURA, T

HIRAKI, A

机构：

来源：

SOLID STATE COMMUNICATIONS | 1984年 / 50卷 / 07期

关键词：

D O I：

10.1016/0038-1098(84)90156-X

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

收藏

页码：673 / 675

页数：3

相关论文

共 6 条

[1] INVESTIGATION OF CHEMICAL PROPERTIES OF STAIN FILMS ON SILICON BY MEANS OF INFRARED SPECTROSCOPY
BECKMANN, KH
[J]. SURFACE SCIENCE, 1965, 3 (04) : 314 - &
[2] SI-H VIBRATIONAL PROPERTIES IN CRYSTALLIZED HYDROGENATED SILICON FABRICATED BY REACTIVE SPUTTERING IN H-2 ATMOSPHERE
HIRAKI, A
IMURA, T
MOGI, K
TASHIRO, M
[J]. JOURNAL DE PHYSIQUE, 1981, 42 (NC4): : 277 - 280
[3] HYDROGENATED CRYSTALLINE SILICON FABRICATED AT LOW-SUBSTRATE TEMPERATURES BY REACTIVE SPUTTERING IN HE-H2 ATMOSPHERE
IMURA, T
MOGI, K
HIRAKI, A
NAKASHIMA, S
MITSUISHI, A
[J]. SOLID STATE COMMUNICATIONS, 1981, 40 (02) : 161 - 164
[4] IMURA T, 1983, UNPUB JAPAN J APPL P, V22
[5] IMURA T, 1982, 6TH P S ION SOURC IO, P273
[6] UBARA H, UNPUB