DISORDER EFFECTS IN ION-IMPLANTED NIOBIUM THIN-FILMS

被引：40

作者：

CAMERLINGO, C

SCARDI, P

TOSELLO, C

VAGLIO, R

机构：

[1] UNIV TRENTO,DIPARTIMENTO FIS,I-38050 POVO,ITALY

[2] CNR,CTR FIS STATI AGGREGATI & IMPIANTO ION,I-38050 POVO,ITALY

[3] UNIV SALERNO,DEPARTIMENTO FIS,I-84100 SALERNO,ITALY

来源：

PHYSICAL REVIEW B | 1985年 / 31卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.31.3121

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：3121 / 3123

页数：3

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