X-RAY ZONE PLATES FABRICATED USING ELECTRON-BEAM LITHOGRAPHY AND REACTIVE ION ETCHING

被引：6

作者：

ARITOME, H

AOKI, H

NAMBA, S

机构：

[1] Osaka Univ, Faculty of Engineering, Science, Toyonaka, Jpn, Osaka Univ, Faculty of Engineering Science, Toyonaka, Jpn

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583242

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

LITHOGRAPHY

引用

页码：265 / 267

页数：3

共 7 条

[1] FOCUSING CHARACTERISTICS OF X-RAY ZONE PLATES FABRICATED BY ELECTRON-BEAM LITHOGRAPHY AND REACTIVE ION ETCHING
ARITOME, H
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NAMBA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (06): : L406 - L408
[2] FUJITA T, 1981, T I ELECTRON COMMUN, V64, P654
[3] PRACTICAL ASPECTS OF MICROFABRICATION IN THE 100 NM REGIME
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COANE, PJ
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1096 - 1100
[4] FABRICATION OF HIGH NUMERICAL APERTURE ZONE PLATES USING DEEP ULTRAVIOLET LITHOGRAPHY
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TAKENAKA, H
KAMIYA, T
[J]. APPLIED OPTICS, 1984, 23 (03): : 504 - 507
[5] THE GOTTINGEN X-RAY MICROSCOPES
NIEMANN, B
RUDOLPH, D
SCHMAHL, G
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 208 (1-3): : 367 - 371
[6] X-RAY ZONE PLATES FABRICATED USING ELECTRON-BEAM AND X-RAY-LITHOGRAPHY
SHAVER, DC
FLANDERS, DC
CEGLIO, NM
SMITH, HI
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1626 - 1630
[7] YANAGIHARA M, UNPUB KEK REPORT