SPUTTERING AND SURFACE-TOPOGRAPHY OF OXIDES

被引：31

作者：

NENADOVIC, T ^{[1
]}

PERRAILLON, B ^{[1
]}

BOGDANOV, Z ^{[1
]}

DJORDJEVIC, Z ^{[1
]}

MILIC, M ^{[1
]}

机构：

[1] CENS, SRMP, F-91191 GIF SUR YVETTE, FRANCE

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1990年 / 48卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(90)90178-W

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

In this work the results of sputtering yield and sputter-topographic evaluation of MgO, Al2O3 and SiO2 by Ar+ bombardment are presented. These values are examined as a function of ion energy (3-40 keV) and of the angle of ion incidence for flat and cylindrical targets bombarded at room temperature. The sputtering yield of a flat target is determined by weight-loss measurement as well as by the depth erosion measurement. For a cylindrical sample the sputtering yield versus ion impingement angle is determined by revealing the topographic evolution produced exclusively by the angular dependence in the sputtering yield. The obtained results for metal oxide sputtering yields obtained by the two different methods are in good mutual agreement. The sputtering yield increases faster with angle of incidence than predicted theoretically. The most evident morphological changes are increase of roughness and void formation. © 1990.

引用

页码：538 / 543

页数：6

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