THERMAL-STABILITY AND ELECTRICAL-RESISTIVITY OF N-14-IMPLANTED NICKEL CONTACTS ON N+-SI

被引:6
作者
BANWELL, T [1 ]
NICOLET, MA [1 ]
SCOTT, DM [1 ]
机构
[1] UNIV CALIF SAN DIEGO,LA JOLLA,CA 92093
关键词
D O I
10.1016/0040-6090(83)90008-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:67 / 71
页数:5
相关论文
共 18 条
  • [1] BANWELL T, 1982, NOV S DEF SEM MAT RE
  • [2] MODELS FOR CONTACTS TO PLANAR DEVICES
    BERGER, HH
    [J]. SOLID-STATE ELECTRONICS, 1972, 15 (02) : 145 - &
  • [3] NI ON SI(111) - REACTIVITY AND INTERFACE STRUCTURE
    CHEUNG, NW
    CULBERTSON, RJ
    FELDMAN, LC
    SILVERMAN, PJ
    WEST, KW
    MAYER, JW
    [J]. PHYSICAL REVIEW LETTERS, 1980, 45 (02) : 120 - 124
  • [4] ELECTRICAL CHARACTERISTICS OF THIN NI2SI, NISI, AND NISI2 LAYERS GROWN ON SILICON
    COLGAN, EG
    MAENPAA, M
    FINETTI, M
    NICOLET, MA
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1983, 12 (02) : 413 - 422
  • [5] FORMATION OF NISI FROM NI2SI STUDIED WITH A PLATINUM MARKER
    FINSTAD, TG
    MAYER, JW
    NICOLET, MA
    [J]. THIN SOLID FILMS, 1978, 51 (03) : 391 - 394
  • [6] GIBBONS JF, 1975, PROJECTED RANGE STAT
  • [7] GROVE AS, 1967, PHYSICS TECHNOLOGY S, P56
  • [8] HO KT, 1983, THIN SOLID FILMS, V104, P243
  • [9] HOVEL HJ, 1975, SEMICONDUCTORS SEMIM, V2, P61
  • [10] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES
    MAYER, JW
    TSAUR, BY
    LAU, SS
    HUNG, LS
    [J]. NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR): : 1 - 13