EFFECT OF ION-BOMBARDMENT DURING GROWTH ON THE ELECTRICAL-RESISTIVITY OF MAGNETRON-SPUTTERED CARBON-FILMS

被引：9

作者：

PETROV, I

ORLINOV, V

IVANOV, I

KOURTEV, J

JELEV, J

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(89)90010-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：239 / 248

页数：10

共 13 条

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[7] INFLUENCE OF THE BASIC PROCESS PARAMETERS ON THE ION ATOM ARRIVAL RATE RATIO DURING MAGNETRON SPUTTER DEPOSITION OF THIN CARBON-FILMS
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