TEMPERATURE-DEPENDENCE OF SEMICONDUCTING AND STRUCTURAL-PROPERTIES OF CR-SI THIN-FILMS

被引：73

作者：

NAVA, F ^{[1
]}

TIEN, T ^{[1
]}

TU, KN ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 06期

关键词：

D O I：

10.1063/1.334389

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2018 / 2025

页数：8

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