POTENTIAL PROFILES IN AN ELECTRON-BEAM-EXCITED PLASMA

被引：9

作者：

HAMAGAKI, M

HARA, T

机构：

[1] The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama, 351-01

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期

关键词：

BEAM PLASMA; ELECTRON BEAM; POTENTIAL PROFILE; SPACE POTENTIAL; POTENTIAL STEP; POTENTIAL DIP; EBEP;

D O I：

10.1143/JJAP.33.4369

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Potential profiles are measured in an electron-beam-excited plasma (EBEP) system with the high-current low-energy electron beam. It is found that there is a potential step around the anode. The space potential at the center of the plasma is more negative than that at the edge plasma by the space charge of beam electrons. It is shown that the potential dip of the radial profile changes into a hill by increasing the beam energy. The radial profile becomes flat with increase of gas pressure.

引用

页码：4369 / 4372

页数：4

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