CONTROL OF FLOATING POTENTIAL IN AN ELECTRON-BEAM-EXCITED PLASMA

被引：12

作者：

HAMAGAKI, M

HARA, T

机构：

[1] The Institute of Physical and Chemical Research, Wako, Saitama, 351-01

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 3A期

关键词：

SHEATH; CONTROL OF SHEATH; FLOATING POTENTIAL; ELECTRON BEAM; BEAM PLASMA; REACTIVE PLASMA; EBEP;

D O I：

10.1143/JJAP.33.L383

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Control of the floating potential is demonstrated experimentally in a high-density reactive plasma without using external DC or RF bias. The difference between the floating potential and the space potential in an electron-beam-excited plasma (EBEP) can be easily controlled in the.range of 20-90 V by changing the accelerating voltage of the electron beam or the angle between the electron beam and the probe surface.

引用

页码：L383 / L386

页数：4

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