CORRELATION BETWEEN THE DIFFUSIVE AND ELECTRICAL BARRIER PROPERTIES OF THE INTERFACE IN POLYSILICON CONTACTED N+-P JUNCTIONS

被引：38

作者：

STORK, JMC

ARIENZO, M

WONG, CY

机构：

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1985年 / 32卷 / 09期

关键词：

D O I：

10.1109/T-ED.1985.22194

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1766 / 1770

页数：5

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