DEPOSITION PROCESSES AND METAL-CUTTING APPLICATIONS OF TIN COATINGS

被引：51

作者：

CHATTERJEE, S

CHANDRASHEKHAR, S

SUDARSHAN, TS

机构：

[1] AT&T BELL LABS, HOLMDEL, NJ 07728 USA

[2] MAT MODIFICAT INC, FALLS CHURCH, VA 22044 USA

来源：

JOURNAL OF MATERIALS SCIENCE | 1992年 / 27卷 / 13期

关键词：

D O I：

10.1007/BF01151815

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The processing techniques and metal working applications of titanium nitride (TiN) coatings are reviewed. The principal processing techniques are physical vapour deposition (PVD) and chemical vapour deposition (CVD). Individual processes within CVD and PVD are reviewed and the important process parameters identified. Various metal working applications of TiN-coated tools in turning, milling, drilling and other processes, are also reviewed. Finally, future trends and needs in the development and application of TiN coatings are identified and discussed.

引用

页码：3409 / 3423

页数：15

共 78 条

[1]

AOKI I, 1985, THIN SOLID FILMS, V30, P253

[2] PREPARATION OF TITANIUM NITRIDE BY A PULSED DC MAGNETRON REACTIVE DEPOSITION TECHNIQUE USING THE MOVING MODE OF DEPOSITION [J].