THE COMPATIBILITY OF ALUMINUM LAYERS ON PLASMA-DEPOSITED W AND WSI2 FILMS

被引：3

作者：

FANG, YK

YANG, HM

机构：

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1988年 / 35卷 / 05期

关键词：

D O I：

10.1109/16.2518

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：706 / 708

页数：3

共 14 条

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[6]

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[8] ELECTRICAL AND MECHANICAL FEATURES OF PLATINUM SILICIDE-ALUMINUM REACTION [J].

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[9]

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[10]

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