SUPPRESSION OF EXTRANEOUS WALL DEPOSITION BY HCL INJECTION IN HYDRIDE VAPOR-PHASE EPITAXY OF III-V SEMICONDUCTORS

被引:23
作者
MIZUTANI, T
WATANABE, H
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关键词
D O I
10.1016/0022-0248(82)90371-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:507 / 515
页数:9
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